JPS6448171U - - Google Patents

Info

Publication number
JPS6448171U
JPS6448171U JP1987142731U JP14273187U JPS6448171U JP S6448171 U JPS6448171 U JP S6448171U JP 1987142731 U JP1987142731 U JP 1987142731U JP 14273187 U JP14273187 U JP 14273187U JP S6448171 U JPS6448171 U JP S6448171U
Authority
JP
Japan
Prior art keywords
case
spinner
treated
coating device
lid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1987142731U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0451907Y2 (en]
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1987142731U priority Critical patent/JPH0451907Y2/ja
Priority to US07/245,464 priority patent/US4941426A/en
Publication of JPS6448171U publication Critical patent/JPS6448171U/ja
Application granted granted Critical
Publication of JPH0451907Y2 publication Critical patent/JPH0451907Y2/ja
Expired legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/02—Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface
    • B05C11/08—Spreading liquid or other fluent material by manipulating the work, e.g. tilting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Coating Apparatus (AREA)
JP1987142731U 1987-09-18 1987-09-18 Expired JPH0451907Y2 (en])

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP1987142731U JPH0451907Y2 (en]) 1987-09-18 1987-09-18
US07/245,464 US4941426A (en) 1987-09-18 1988-09-16 Thin-film coating apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1987142731U JPH0451907Y2 (en]) 1987-09-18 1987-09-18

Publications (2)

Publication Number Publication Date
JPS6448171U true JPS6448171U (en]) 1989-03-24
JPH0451907Y2 JPH0451907Y2 (en]) 1992-12-07

Family

ID=15322269

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1987142731U Expired JPH0451907Y2 (en]) 1987-09-18 1987-09-18

Country Status (2)

Country Link
US (1) US4941426A (en])
JP (1) JPH0451907Y2 (en])

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003528708A (ja) * 1999-08-27 2003-09-30 マイクロン・テクノロジー・インコーポレーテッド スピンしている超小型基板上の空気を制御する方法および装置

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5416047A (en) * 1990-09-07 1995-05-16 Tokyo Electron Limited Method for applying process solution to substrates
JP2843134B2 (ja) * 1990-09-07 1999-01-06 東京エレクトロン株式会社 塗布装置および塗布方法
DE9103494U1 (de) * 1991-03-21 1992-07-16 HAMATECH Halbleiter-Maschinenbau und Technologie GmbH, 7137 Sternenfels Vorrichtung zur Belackung von Substraten
DE4203913C2 (de) * 1992-02-11 1996-09-19 Fairchild Convac Gmbh Geraete Verfahren und Vorrichtung zum Aufbringen und/oder zum partiellen Entfernen einer dünnen Schicht auf ein bzw. von einem Substrat
US5211753A (en) * 1992-06-15 1993-05-18 Swain Danny C Spin coating apparatus with an independently spinning enclosure
US5326398A (en) * 1992-07-22 1994-07-05 Statspin Technologies Compact slide spinner using a disposable slide holder
US5549750A (en) * 1992-07-22 1996-08-27 Norfolk Scientific, Inc. Disposable slide holder
US5480484A (en) * 1994-03-01 1996-01-02 Statspin Technologies Cytology centrifuge apparatus
US5679154A (en) * 1994-03-01 1997-10-21 Norfolk Scientific, Inc. Cytology centrifuge apparatus
JP3099054B2 (ja) * 1994-09-09 2000-10-16 東京エレクトロン株式会社 塗布装置及びその方法
WO1996014164A1 (en) * 1994-11-07 1996-05-17 Macronix International Co., Ltd. Spin-on-glass process with controlled environment
US5716673A (en) * 1994-11-07 1998-02-10 Macronix Internationalco., Ltd. Spin-on-glass process with controlled environment
US6004622A (en) * 1994-11-07 1999-12-21 Macronix International Co., Ltd. Spin-on-glass process with controlled environment
TW344097B (en) * 1996-04-09 1998-11-01 Tokyo Electron Co Ltd Photoresist treating device of substrate and photoresist treating method
CA2270807A1 (en) * 1999-05-03 2000-11-03 Ibm Canada Limited-Ibm Canada Limitee Closed chamber method and apparatus for the coating of liquid films
US20070128887A1 (en) * 2005-12-07 2007-06-07 Macronix International Co., Ltd. Spin-on glass passivation process
DE102006007446B3 (de) * 2006-02-17 2007-08-02 Stangl Semiconductor Equipment Ag Vorrichtung und Verfahren zum gleichmäßigen Beschichten von Substraten
JP4949338B2 (ja) * 2008-08-06 2012-06-06 東京エレクトロン株式会社 液処理装置
US9209062B1 (en) * 2014-05-28 2015-12-08 Spintrac Systems, Inc. Removable spin chamber with vacuum attachment

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5748980A (en) * 1980-09-05 1982-03-20 Mitsubishi Chem Ind Ltd Cyclopropanecarboxylic ester
JPS6231622A (ja) * 1985-08-02 1987-02-10 Sankyo Giken Kogyo Kk 種袋給送方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4108109A (en) * 1974-05-13 1978-08-22 Dynatech Corporation Blood filming apparatus
JPS584588B2 (ja) * 1977-06-30 1983-01-27 松下電器産業株式会社 粘性剤塗布装置
JPS5498574A (en) * 1978-01-20 1979-08-03 Matsushita Electric Ind Co Ltd Rotary coating unit of viscous material
JPS5927229B2 (ja) * 1979-09-19 1984-07-04 富士通株式会社 スピンナ−

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5748980A (en) * 1980-09-05 1982-03-20 Mitsubishi Chem Ind Ltd Cyclopropanecarboxylic ester
JPS6231622A (ja) * 1985-08-02 1987-02-10 Sankyo Giken Kogyo Kk 種袋給送方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003528708A (ja) * 1999-08-27 2003-09-30 マイクロン・テクノロジー・インコーポレーテッド スピンしている超小型基板上の空気を制御する方法および装置

Also Published As

Publication number Publication date
JPH0451907Y2 (en]) 1992-12-07
US4941426A (en) 1990-07-17

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